发明名称 レジスト現像装置およびモールド製造方法
摘要 <P>PROBLEM TO BE SOLVED: To suppress complication of a device configuration and accompanying cost increase and such, and to suppress a temperature fluctuation of a developer at an exposed part of a piping, which is not covered with a thermal insulation jacket. <P>SOLUTION: In the resist developing device, comprising: a developer supply pipe; and a temperature holding part, which coats the developer supply pipe, and in which a thermostatic control medium flows, the developer supply pipe includes: a coating part covered with the temperature holding part; and an exposed part, which is not covered with the temperature holding part. In the temperature holding part, a lead-out part which leads the thermostatic control medium to the exposed part is provided. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5859781(B2) 申请公布日期 2016.02.16
申请号 JP20110194788 申请日期 2011.09.07
申请人 HOYA株式会社 发明人 小林 英雄;井山 博雅
分类号 H01L21/027;G03F7/30 主分类号 H01L21/027
代理机构 代理人
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