Polymer compound, resin composition for photoresists, and method for producing semiconductor

摘要

Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects.;The polymer compound according to the present invention includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) is represented by Formula (a), and the monomer unit (b) includes an alicyclic skeleton containing a polar group. The polar group of the monomer unit (b) is preferably at least one group selected from —O—, —C(═O)—, —C(═O)—O—, —O—C(═O)—O—, —C(═O)—O—C(═O)—, —C(═O)—NH—, —S(═O)—O—, —S(═O)2—O—, —ORa, —C(═O)—ORa, and —CN, where Ra represents, independently in each occurrence, optionally substituted alkyl.;

主权项

1. A polymer compound, comprising:
a monomer unit (a) represented by Formula (a); and a monomer unit (b) comprising an alicyclic skeleton comprising a polar group, Formula (a) expressed as follows:wherein R is selected from hydrogen, halogen, and optionally halogenated C1-C6 alkyl; R1 and R2 each represent, identically or differently, optionally substituted C1-C6 alkyl; R3 is a substituent bonded to Ring Z1 and is, independently in each occurrence, selected from oxo, alkyl, optionally protected hydroxyl, optionally protected hydroxyalkyl, optionally protected carboxy, and cyano; n represents an integer from 0 to 3, where, when n is 2 or 3, two or three occurrences of R3 may be identical or different; and Ring Z1 represents a C3 or C4 alicyclic hydrocarbon ring,
wherein the monomer unit (b) comprises at least one selected from the group consisting of monomer units (b1) to (b5) respectively represented by Formulae (b1) to (b5):wherein R is, independently in each occurrence, selected from hydrogen, halogen, and optionally halogenated C1-C6 alkyl; A is, independently in each occurrence, selected from a single bond and a linkage group; X is, independently in each occurrence, selected from non-bond, methylene, ethylene, oxygen, and sulfur; Y is selected from methylene and carbonyl; R4, R5, R6, R7, and R8 are each, identically or differently, selected from hydrogen, alkyl, optionally protected hydroxyl, optionally protected hydroxyalkyl, optionally protected carboxy, and cyano.