High definition heater and method of operation

摘要

An apparatus is provided, by way of example, a heater for use in semiconductor processing equipment that includes a base functional layer having at least one functional zone. A substrate is secured to the base functional layer, and a tuning layer is secured to the substrate opposite the base functional layer. The tuning layer includes a plurality of zones that is greater in number than the zones of the base functional layer, and the tuning layer has lower power than the base functional layer. Further, a component, such as a chuck by way of example, is secured to the tuning layer opposite the substrate. The substrate defines a thermal conductivity to dissipate a requisite amount of power from the base functional layer.

主权项

1. A heater comprising:
a base plate; a base heater secured to the base plate, the base heater comprising at least one zone; a substrate secured to the base heater; a tuning heater secured to the substrate opposite the base heater, the tuning heater comprising a plurality of zones that is greater in number than the zones of the base heater, and the tuning heater providing lower power than the base heater; and a chuck secured to the tuning heater opposite the substrate, wherein the substrate defines a thermal conductivity to dissipate power from the base heater.