发明名称 半導体装置およびその試験方法
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which can electrically detect damages of an insulation layer under a bonding pad, which is caused by a stress generated in wire bonding; and a semiconductor device testing method which can detect introduced damages to determine non-defective or defective.SOLUTION: A semiconductor device (power IC) comprises: a polysilicon 5 arranged on an oxide film 4; a pn diode 9 formed on the polysilicon 5; a first bonding pad 11 arranged on an n-cathode layer 6 while sandwiching an interlayer insulation film 10; and a second bonding pad 12 arranged on a p-anode layer 7. By this configuration, the semiconductor device can electrically detect whether damages introduced to the interlayer insulation film 10 penetrate the interlayer insulation film 10.
申请公布号 JP5861822(B2) 申请公布日期 2016.02.16
申请号 JP20110235795 申请日期 2011.10.27
申请人 富士電機株式会社 发明人 吉田 泰樹
分类号 H01L21/822;H01L21/3205;H01L21/60;H01L21/66;H01L21/768;H01L23/522;H01L27/04 主分类号 H01L21/822
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