Plasma spray deposition of photovoltaic thin films with grain boundary minimization

摘要

Methods are described for depositing thin films, such as those used in forming a photovoltaic cell or device. In particular embodiments, one or more layers are deposited on a substrate by plasma spraying over the substrate. A grain size of grains in each of the one or more layers is at least approximately two times greater than a thickness of the respective layer. Accordingly, large flat-grained structures are formed in each respective layer, and grain boundaries within each respective layer can be minimized.

主权项

1. A method, comprising:
providing a substrate suitable for use in a photovoltaic device; plasma spraying one or more layers over the substrate, an average grain size of grains in each of the one or more layers being at least approximately two times greater than a thickness of the respective layer, wherein a grain size of the grains is a measure of a dimension of the respective grains along a plane parallel to the one or more layers and the thickness of the respective layer is a measure of a dimension of the respective layer along a plane perpendicular to the one or more layers.