发明名称 |
Line width roughness improvement with noble gas plasma |
摘要 |
A method for forming lines in an etch layer on a substrate may comprise providing a ultra-violet (UV) producing gas to a vacuum chamber having a photoresist mask, ionizing the UV producing gas to produce UV rays to irradiate the photoresist mask, and etching the lines into the etch layer through the photoresist mask. |
申请公布号 |
US9263284(B2) |
申请公布日期 |
2016.02.16 |
申请号 |
US201414279114 |
申请日期 |
2014.05.15 |
申请人 |
Lam Research Corporation |
发明人 |
Cheng Shih-Yuan;Liu Shenjian;Hong Youn Gi;Fu Qian |
分类号 |
H01L21/3065;H01L21/308;H01L21/027;H01L21/311;H01L21/67 |
主分类号 |
H01L21/3065 |
代理机构 |
Beyer Law Group LLP |
代理人 |
Beyer Law Group LLP |
主权项 |
1. A method for forming lines in an etch layer on a substrate, comprising:
placing the substrate into a vacuum chamber; forming a photoresist mask having a plurality of patterned lines over the etch layer; providing a high-intensity vacuum ultra-violet (VUV) producing gas comprising argon gas into the vacuum chamber; ionizing the argon gas to produce VUV rays to irradiate the photoresist mask; and etching the lines into the etch layer through the photoresist mask. |
地址 |
Fremont CA US |