| 发明名称 | Imprint apparatus, and method of manufacturing article | ||
| 摘要 | The present invention provides an imprint apparatus which performs an imprint process in which an imprint material on a substrate is molded with a mold to form a pattern on the substrate, the apparatus including a controller configured to control the imprint process to form a predetermined layer on the substrate with a target layer, which is formed on the substrate, used as an alignment reference, wherein the controller is configured to select a mold from a plurality of molds prepared for the predetermined layer, such that an overlay error between the target layer and the predetermined layer falls within a tolerance. | ||
| 申请公布号 | US9261776(B2) | 申请公布日期 | 2016.02.16 |
| 申请号 | US201213600476 | 申请日期 | 2012.08.31 |
| 申请人 | CANON KABUSHIKI KAISHA | 发明人 | Hayashi Nozomu |
| 分类号 | B29C59/02;G03F7/00;B82Y10/00;B82Y40/00 | 主分类号 | B29C59/02 |
| 代理机构 | Rossi, Kimms & McDowell LLP | 代理人 | Rossi, Kimms & McDowell LLP |
| 主权项 | 1. An imprint apparatus for performing an imprint process in which an imprint material on a substrate is molded with a mold to form a pattern on the substrate, the imprint apparatus comprising: a controller configured to: control the imprint process to form a predetermined layer on the substrate with a target layer, which is formed on the substrate, used as an alignment reference;obtain information of a difference between a shape of a shot region in the target layer, and a shape of a shot region in an upper layer formed above the target layer; andselect a mold from a plurality of molds prepared for the predetermined layer, based on the difference and a shape of a mold used for forming the upper layer, so that an overlay error between the target layer and the predetermined layer falls within a tolerance. | ||
| 地址 | Tokyo JP | ||