| 主权项 |
1. A substrate processing apparatus, comprising:
an outer chamber having an opening; an injector assembly disposed through the opening in the outer chamber; a recess disposed in the outer chamber in a closed loop about the opening, wherein the recess has a trapezoidal cross-section tapering away from a bottom surface; and a sealing apparatus comprising: a continuous body forming a closed loop disposed in the recess, wherein the continuous body has a trapezoidal cross-section having a first side, an opposing second side, a bottom disposed between the first and second sides, and a third side opposite the bottom, wherein the first side, opposing second side, and bottom are at least partially disposed within the recess, and wherein the continuous body tapers away from the bottom surface of the recess; and an arm coupled to the third side of the continuous body proximate only the first side and extending away from the continuous body from the first side toward the second side such that the arm and the first side form a single continuous taper surface, the arm configured to provide a force when deflected towards the continuous body by the injector assembly to form a first seal between the outer chamber and the injector assembly. |
