发明名称 FILM FORMING APPARATUS
摘要 The present invention relates to a film forming apparatus which forms a film while a substrate holding portion holding multiple substrates in a shelf shape is disposed on a bell-shaped reactive container, to improve productivity of the apparatus. The film forming apparatus comprises: a first raw gas supply unit and a second raw gas supply unit which supply raw gas to a first substrate holding area and a second substrate holding area, restrictively, along an arrangement direction of substrates; a reaction gas supply unit; a purge gas supply unit supplies, when the raw gas is being supplied to any one from the first substrate holding area and the second substrate holding area, purge gas to the other one; and a partition substrate which is held between the first substrate holding area and the second substrate holding area in the substrate holding portion. A cycle configured by the supply of the raw gas and the supply of the reaction gas to the first substrate holding area and the second substrate is controlled to be performed many times.
申请公布号 KR20160017608(A) 申请公布日期 2016.02.16
申请号 KR20150101822 申请日期 2015.07.17
申请人 TOKYO ELECTRON LIMITED 发明人 FUKUSHIMA KOHEI;MOTOYAMA YUTAKA;CHOU PAO HWA
分类号 H01L21/02;H01L21/285;H01L21/314 主分类号 H01L21/02
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