| 摘要 |
The present invention relates to a wafer cleaning device which effectively removes a metal pollutant or an ionic pollutant from cleaning water even if the device is not in contact with a cleaning bath. The wafer cleaning device includes a cleaning bath which stores cleaning water for washing a wafer; and a magnetic unit which is movably installed on the outside of the cleaning bath, and collects an ionic pollutant or a metal pollutant from the cleaning water as a magnetic field and an induced current are generated in the cleaning bath. |
