发明名称 窒化物半導体素子
摘要 <P>PROBLEM TO BE SOLVED: To provide a nitride semiconductor element with improved current diffusivity in a p-side nitride semiconductor layer. <P>SOLUTION: A nitride semiconductor element includes a stack of an n-type nitride semiconductor layer, an active layer, and a p-type nitride semiconductor layer on a substrate in this order. The nitride semiconductor element has a p-type contact layer and an AlN layer having a different composition from the p-type contact layer in the p-type nitride semiconductor layer, and the p-type contact layer is in contact with the AlN layer. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5862177(B2) 申请公布日期 2016.02.16
申请号 JP20110222648 申请日期 2011.10.07
申请人 日亜化学工業株式会社 发明人 成田 准也;岡田 卓也;合田 貴彦
分类号 H01L33/32 主分类号 H01L33/32
代理机构 代理人
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