| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide silica sol for polishing, having a high polishing rate and suitable for precision polishing, and to provide a polishing composition and a method for producing silica sol for polishing. <P>SOLUTION: The silica sol is obtained by dispersing, in a dispersion medium, nonspherical silica fine particles having an average particle diameter measured by dynamic light scattering method in the range of 5-300 nm, and has solid concentration of 10-60 wt.%, wherein, in the peak areas at chemical shifts of -73 to -120 ppm in<SP POS="POST">29</SP>Si-NMR spectrum measurement, the area of Q4 is ≥88% and the area of Q3 is ≤11%, provided that the chemical shifts are based on tetramethylsilane as a reference material, Q4 is a peak in the range of -100 to -120 ppm, and Q3 is a peak in the range of -82 to -100 ppm. <P>COPYRIGHT: (C)2012,JPO&INPIT |
