Apparatus and method for treating substrate

摘要

Provided are an apparatus and method for treating a substrate, and more particularly, to a substrate treatment apparatus having a cluster structure and a substrate treatment method using the same. The apparatus for treating the substrate includes a load port on which a container for receiving the substrate is placed, a treatment module for treating the substrate, and a transfer module including a robot for transferring the substrate between the container and the treatment module. The treatment module includes a transfer chamber including a robot for transferring the substrate, a load lock chamber disposed between the transfer chamber and the transfer module, a first treatment chamber disposed spaced from the transfer module around the transfer chamber to perform a first treatment process, and a second treatment chamber disposed around the transfer chamber to perform a second treatment process.

主权项

1. An apparatus for treating a substrate, the apparatus comprising:
a load port on which a container for receiving the substrate is placed; a treatment module for treating the substrate; and a transfer module comprising a robot for transferring the substrate between the container and the treatment module; wherein the treatment module comprises:
a transfer chamber comprising a robot for transferring the substrate,a load lock chamber disposed between the transfer chamber and the transfer module,a first treatment chamber spaced apart from the transfer module about a perimeter of the transfer chamber to perform a first treatment process, anda second treatment chamber disposed around the transfer chamber to perform a second treatment process, wherein the second treatment chamber comprises a housing disposed under the load lock chamber, a plasma source disposed above the load lock chamber to generate plasma, and a supply tube disposed on an outer wall of the load lock chamber to supply the generated plasma into the housing; andwherein the second treatment chamber is disposed between the transfer chamber and the transfer module and is configured to transfer the substrate between the transfer module and the treatment module.