MASK FOR PHOTOLITHOGRAPHY, METHOD OF MANUFACTURING THE SAME AND METHOD OF MANUFACTURING SUBSTRATE USING THE SAME

摘要

A mask for exposure comprises: a transparent substrate; a phase shift pattern which is disposed on the transparent substrate, and changes a phase of light; a dielectric layer which is disposed on the transparent substrate in which the phase shift pattern is disposed; and a negative refractive-index meta material layer on the dielectric layer. A manufacturing method of a substrate comprises the steps of: situating the mask for exposure on a substrate in which a photoresist layer is formed to face the substrate; transferring light to the photoresist layer through the mask for exposure, and transferring an evanescent wave of the light to the photoresist layer, wherein the evanescent wave of the light does not disappear due to plasmon resonance or phonon resonance generated by the dielectric layer and the negative refractive-index meta material layer.