发明名称 Power semiconductor devices, structures, and related methods
摘要 Power semiconductor devices, and related methods, where majority carrier flow is divided into paralleled flows through two drift regions of opposite conductivity types.
申请公布号 US9263573(B2) 申请公布日期 2016.02.16
申请号 US201414523492 申请日期 2014.10.24
申请人 MAXPOWER SEMICONDUCTOR INC. 发明人 Darwish Mohamed N.;Zeng Jun;Blanchard Richard A.
分类号 H01L29/78;H01L29/06;H01L29/66;H01L29/739;H01L21/265;H01L29/08;H01L29/10;H01L29/40;H01L29/417;H01L29/423 主分类号 H01L29/78
代理机构 Groover & Associates PLLC 代理人 Groover & Associates PLLC ;Groover Robert;Groover Gwendolyn
主权项 1. A semiconductor device, comprising: a first-conductivity-type semiconductor source region; a second-conductivity-type semiconductor body region; a gate electrode, which is capacitively coupled to invert a horizontal portion of said body region; a semiconductor drift region which includes both first-conductivity-type and second-conductivity-type semiconductor stripes in parallel; a trench, containing immobile electrostatic charge which is capacitively coupled to invert parts of said second-conductivity-type stripes; and a first-conductivity-type semiconductor drain region; wherein said body region is interposed between said source region and said drift region; and wherein said first-conductivity-type and second-conductivity-type semiconductor stripes are each laterally interposed between said body region and said drain region; whereby, in the ON state, majority carriers flow both through said first-conductivity-type and said second-conductivity-type stripes in parallel.
地址 San Jose CA US