| 摘要 |
The present invention provides an optical patterning mask and a manufacturing method of a display device using the same. According to one embodiment of the present invention, the optical patterning mask includes: a base substrate; a reflective layer formed on the base substrate, and including a first aperture part; a shadow pattern formed on the base substrate, and disposed inside the first aperture part; an insulation layer formed on the base substrate to cover the reflective layer and the shadow pattern; an absorption layer formed on the insulation layer; a bank layer formed on the absorption layer, and including a second aperture part located at a position where the second aperture part is overlapped with the first aperture part; a heat conduction preventing pattern formed on the absorption layer and located at a position where the heat conduction preventing pattern is overlapped with the shadow pattern; and a transfer layer formed on the absorption layer, the bank layer, and the heat conduction preventing pattern. |
