| 摘要 |
The purpose of the present invention is to provide a gas barrier film exhibiting excellent gas barrier performance, bending tolerance, and cutting process suitability, and a manufacturing method for the gas barrier film. The present invention relates to a gas barrier film and a manufacturing method for the gas barrier film characterised by a polysilazane-containing fluid being coated on a first barrier layer of a substrate to form a polysilazane layer, said substrate having a coefficient of thermal expansion of 1-50×10-6/°C, and having the first barrier layer formed on at least one surface thereof by chemical vapour deposition, whereafter a second barrier layer is formed by converting the polysilazane layer into a ceramic using vacuum ultraviolet light, or the second barrier layer is formed by applying and drying a silica-containing fluid for forming a sol-gel coating layer. |
