PREPARING METHOD OF INORGANIC THIN FILM CONTAINING MULTIPLE PRECURSORS, AND APPARATUS THEREFOR

摘要

The present invention relates to a method for manufacturing an inorganic thin film containing multiple precursors and a manufacturing apparatus for the inorganic thin film. Provided is a method for manufacturing an inorganic thin film, which comprises: plasma treating a base material by using a source gas and a reaction gas; and forming an inorganic thin film on the base material as the source gas and the reaction gas react on a surface of the base material by heating the base material at a temperature lower than or equal to a thermal decomposition temperature of the source gas.