SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM

摘要

The present invention relates to a polymeric compound containing a silicone structure which has a repeat unit represented by formula (1) and a weight average molecular weight of 3,000 to 500,000. In formula (1), X is an organic group represented by formula (2); Y is an organic group represented by formula (3); and W is an organic group represented by formula (4). According to the present invention, a chemically amplified negative resist material can be obtained, wherein the material can efficiently resolve the problem of tearing encountered on metal wires such as Cu or Al, on electrodes, and on substrates such as SiN substrate, particularly.