| 摘要 |
The present invention relates to a substrate processing device. The substrate processing device according to an embodiment of the present invention comprises: a processing container having a processing space; a supporting unit to support a substrate inside the processing space; a processing liquid supply unit to supply a processing liquid to an upper side of the substrate supported by the supporting unit; an elevating unit to move the processing container or the supporting unit in a vertical direction to change a relative height between the processing container and the supporting unit; an exhaust unit to discharge fume generated in the processing container; and a controller to control the exhaust unit. The exhaust unit comprises: an integrated exhaust pipe combined to the processing container; a first exhaust pipe installed with a first valve which is connected to the integrated exhaust pipe, and opens and closes an inner space thereof; and a second exhaust pipe installed with a second valve which is connected to the integrated exhaust pipe, and opens and closes an inner space thereof. The controller discharges air current inside the processing container to the first exhaust pipe when the substrate is processed with a first processing liquid, discharges the air current inside the processing space to the second exhaust pipe when the substrate is processed with a second processing liquid, and controls the opening and closing of the first and second valves with a mode selected among a plurality of modes when a substrate processing is started with the second processing liquid after a substrate processing is completed with the first processing liquid. |
