Self-protected metal-oxide-semiconductor field-effect transistor

摘要

Device structures, design structures, and fabrication methods for a metal-oxide-semiconductor field-effect transistor. A gate structure is formed on a top surface of a substrate. First and second trenches are formed in the substrate adjacent to a sidewall of the gate structure. The second trench is formed laterally between the first trench and the first sidewall. First and second epitaxial layers are respectively formed in the first and second trenches. A contact is formed to the first epitaxial layer, which serves as a drain. The second epitaxial layer in the second trench is not contacted so that the second epitaxial layer serves as a ballasting resistor.

主权项

1. A device structure fabricated using a substrate, the device structure comprising:
a doped region that intersects the top surface of the substrate; a gate structure on the top surface of the substrate, the gate structure having a first sidewall; a first epitaxial layer in a first trench in the substrate, the first trench extending through the doped region adjacent to the first sidewall of the gate structure; a second epitaxial layer in a second trench in the substrate, the second trench extending through the doped region adjacent to the first sidewall of the gate structure, and the second trench laterally between the first trench and the first sidewall of the gate structure so that a portion of the doped region laterally separates the first epitaxial layer from the second epitaxial layer; and a contact to the first epitaxial layer, wherein the first epitaxial layer, the second epitaxial layer, and the portion of the doped region have the same conductivity type, the second epitaxial layer is not contacted, the first epitaxial layer comprises a drain of a field-effect transistor, and the second epitaxial layer and the doped region comprise a first ballasting resistor that is coupled with the drain of the field-effect transistor.