SUBSTRATE CLEANING METHOD AND STORAGE MEDIUM

摘要

The present invention can obtain high particle removal performance. A substrate cleaning method according to an embodiment includes a film forming process liquid supplying process and a removal liquid supplying process. The film forming process liquid supplying process includes an organic solvent and fluorine atoms and supplies a film forming process liquid containing polymer soluble in the organic solvent to the substrate. The removal liquid supplying process supplies a removal liquid for removing a process film to the process film formed by solidifying or hardening the film forming liquid on the substrate.