RESIST STRIPPER COMPOSITION AND A METHOD OF STRIPPING RESIST USING THE SAME

摘要

The present invention relates to a resist stripping composition comprising an amide compound, an amine compound, and a glycol ether compound; and to a resist stripping method using the same. The stripping composition comprises at least one pair of an amide conjugate compound and an amine conjugate compound. The amide conjugate compound can be generated by amidation of the amine conjugate compound, and the amine conjugate compound can be generated by deamidation of the amide conjugate compound. The resist stripping composition has remarkable storage stability by minimizing change of the stripping composition with the passage of time, and can remarkably remove resist patterns which are changed after wet or dry etching by having great polarity of the stripping solution while having little process loss.