| 摘要 |
The present invention relates to a shutter apparatus and a substrate treatment apparatus comprising the same. The shutter apparatus opening and closing a chamber for a substrate to enter and exit the chamber, includes: a fixed frame part which is combined to an outer part of a substrate entrance part formed on one side of the chamber; a movable frame part which is installed to move back and forth on the fixed frame part; a shutter part comprising at least one shutter installed to ascend and descend on the movable frame part; a frame driving part for providing a forward and backward driving force to the movable frame part; and a shutter driving part for providing an ascending and descending driving force to the shutter part. Therefore, the present invention provides the effect of increasing loading efficiency of the substrate in the chamber and improving separation distance correspondence of the substrate by a robot at the same time, by installing the movable frame part moving forward and backward as to the fixed frame part combined to the chamber, and the shutter part moving up and down. |
