发明名称 |
GROOVED INSULATOR TO REDUCE LEAKAGE CURRENT |
摘要 |
A plasma source includes a first electrode and a second electrode having respective surfaces, and an insulator that is between and in contact with the electrodes. The electrode surfaces and the insulator surface substantially define a plasma cavity. The insulator surface defines one or more grooves configured to prevent deposition of material in a contiguous form on the insulator surface. A method of generating a plasma includes introducing one or more gases into a plasma cavity defined by a first electrode, a surface of an insulator that is in contact with the first electrode, and a second electrode that faces the first electrode. The insulator surface defines one or more grooves where portions of the insulator surface are not exposed to a central region of the cavity. The method further includes providing RF energy across the first and second electrodes to generate the plasma within the cavity. |
申请公布号 |
US2016042920(A1) |
申请公布日期 |
2016.02.11 |
申请号 |
US201414454493 |
申请日期 |
2014.08.07 |
申请人 |
Applied Materials, Inc. |
发明人 |
CHO TAE;Kang Sang Won;Yang Dongqing;Lu Raymond W.;Hillman Peter;Celeste Nicholas;Tan Tien Fak;Park Soonam;Lubomirsky Dmitry |
分类号 |
H01J37/32;H01J9/24 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
1. A plasma source, comprising:
a first electrode and a second electrode, the first and second electrodes comprising first and second electrode surfaces respectively; and an insulator, comprising an insulator surface, disposed between and in contact with the first and second electrodes; wherein the first and second electrode surfaces and the insulator surface substantially define a plasma cavity; and the insulator surface defines one or more grooves configured to prevent deposition of material in a contiguous form on the insulator surface exposed to the plasma cavity. |
地址 |
Santa Clara CA US |