发明名称 GROOVED INSULATOR TO REDUCE LEAKAGE CURRENT
摘要 A plasma source includes a first electrode and a second electrode having respective surfaces, and an insulator that is between and in contact with the electrodes. The electrode surfaces and the insulator surface substantially define a plasma cavity. The insulator surface defines one or more grooves configured to prevent deposition of material in a contiguous form on the insulator surface. A method of generating a plasma includes introducing one or more gases into a plasma cavity defined by a first electrode, a surface of an insulator that is in contact with the first electrode, and a second electrode that faces the first electrode. The insulator surface defines one or more grooves where portions of the insulator surface are not exposed to a central region of the cavity. The method further includes providing RF energy across the first and second electrodes to generate the plasma within the cavity.
申请公布号 US2016042920(A1) 申请公布日期 2016.02.11
申请号 US201414454493 申请日期 2014.08.07
申请人 Applied Materials, Inc. 发明人 CHO TAE;Kang Sang Won;Yang Dongqing;Lu Raymond W.;Hillman Peter;Celeste Nicholas;Tan Tien Fak;Park Soonam;Lubomirsky Dmitry
分类号 H01J37/32;H01J9/24 主分类号 H01J37/32
代理机构 代理人
主权项 1. A plasma source, comprising: a first electrode and a second electrode, the first and second electrodes comprising first and second electrode surfaces respectively; and an insulator, comprising an insulator surface, disposed between and in contact with the first and second electrodes; wherein the first and second electrode surfaces and the insulator surface substantially define a plasma cavity; and the insulator surface defines one or more grooves configured to prevent deposition of material in a contiguous form on the insulator surface exposed to the plasma cavity.
地址 Santa Clara CA US