| 发明名称 |
FOCUS CORRECTION METHOD, FOCUS CORRECTION APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM |
| 摘要 |
In accordance with an embodiment, a focus correction method includes obtaining a first defocus amount by measuring a QC wafer, obtaining a second defocus amount by measuring a product wafer, generating high-order focus correction data for an entire wafer surface by interpolating the second defocus amount on the basis of the first defocus amount, and correcting a focus on the basis of the high-order focus correction data. |
| 申请公布号 |
US2016041479(A1) |
申请公布日期 |
2016.02.11 |
| 申请号 |
US201514750388 |
申请日期 |
2015.06.25 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TANIZAKI Hiroyuki |
| 分类号 |
G03F7/20;G01B11/14 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A focus correction method comprising:
obtaining a first defocus amount by measuring a QC wafer; obtaining a second defocus amount by measuring a product wafer; generating high-order focus correction data for an entire wafer surface by interpolating the second defocus amount on the basis of the first defocus amount; and correcting a focus on the basis of the high-order focus correction data. |
| 地址 |
Minato-ku JP |
