METHOD FOR PRODUCING A STRUCTURE

摘要

The invention relates to a method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device, in that a plurality of partial structures are written sequentially, wherein for writing the partial structures a write field of the exposure device is displaced and positioned sequentially and that a partial structure is written in the write field in each case, and wherein for positioning of the write field a reference structure is detected by means of an imaging measuring device. For calibration of the write field in the respectively positioned write field, before, during or after writing a partial structure, at least one reference structure element assigned to this partial structure is produced in the lithographic material with the writing beam, wherein the reference structure element after the displacement of the write field is detected by means of the imaging measuring device for writing a further partial structure.

主权项

1. A method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device in that a plurality of partial structures (10) are written sequentially, wherein for writing the partial structures (10) a write field (12) of the exposure device is sequentially displaced and positioned and in each case a partial structure (10) is written in the write field (12), and wherein for positioning the write field (12) a reference structure is detected in the lithographic material by means of an imaging measuring device, characterized in that
in the respectively positioned write field (12), before, during or after the writing of a partial structure (10) at least one reference element (14) assigned to this partial structure (10) is produced with the writing beam in the lithographic material, wherein the at least one reference structure element (14) after displacement of the write field (12) for the writing of a further partial structure (10) is detected by means of the imaging measuring device.