发明名称 CONFIGURATIONS AND TECHNIQUES TO INCREASE INTERFACIAL ANISOTROPY OF MAGNETIC TUNNEL JUNCTIONS
摘要 Embodiments of the present disclosure describe configurations and techniques to increase interfacial anisotropy of magnetic tunnel junctions. In embodiments, a magnetic tunnel junction may include a cap layer, a tunnel barrier, and a magnetic layer disposed between the cap layer and the tunnel barrier. A buffer layer may, in some embodiments, be disposed between the magnetic layer and a selected one of the cap layer or the tunnel barrier. In such embodiments, the interfacial anisotropy of the buffer layer and the selected one of the cap layer or the tunnel barrier may be greater than an interfacial anisotropy of the magnetic layer and the selected one of the cap layer or the tunnel barrier. Other embodiments may be described and/or claimed.
申请公布号 WO2016022107(A1) 申请公布日期 2016.02.11
申请号 WO2014US49794 申请日期 2014.08.05
申请人 INTEL CORPORATION;OGUZ, KAAN;DOCZY, MARK;DOYLE, BRIAN;KUO, CHARLES;CHAUDHRY, ANURAG;CHAU, ROBERT 发明人 OGUZ, KAAN;DOCZY, MARK;DOYLE, BRIAN;KUO, CHARLES;CHAUDHRY, ANURAG;CHAU, ROBERT
分类号 H01L43/08;G11C11/16 主分类号 H01L43/08
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