发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 A phosphoric acid solution in a tank for generation circulates in a circulating system. The circulating system is configured to be changed into a first state that the phosphoric acid solution circulates by passing through a bypass pipe, or a second state that the phosphoric acid solution circulates by passing through a filter. When a silicon containing solution is supplied into the tank for generation, the state of the circulating system is changed into the first state. When silicon particles are uniformly distributed into the phosphoric acid solution, the state of the circulating system is changed into the second state. A filtering member is installed in the tank for generation. The filtering member accommodates the silicon containing solution. The filtering member is dipped in the phosphoric acid solution stored in the tank for generation. The silicon containing solution passes through the filtering member, and then the silicon containing solution is mixed with the phosphoric acid solution.
申请公布号 KR20160014535(A) 申请公布日期 2016.02.11
申请号 KR20150104899 申请日期 2015.07.24
申请人 SCREEN HOLDINGS CO., LTD. 发明人 HINODE TAIKI;OTA TAKASHI;SAITO KAZUHIDE;NAMBA TOSHIMITSU;KAMIHIRO YASUKATSU
分类号 H01L21/3213;H01L21/306;H01L21/311;H01L21/67 主分类号 H01L21/3213
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