ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS

摘要

An ion implanter includes: a beam deflector that deflects an ion beam passing through a previous stage beam path and outputs the beam to pass through a subsequent stage beam path toward a wafer; a beam filter slit that partially shields the beam traveling through the subsequent stage beam path and allows passage of a beam component having a predetermined trajectory toward the wafer; a dose cup that is disposed between the beam deflector and the beam filter slit and measures a part of the beam exiting from the beam deflector as a beam current; and a trajectory limiting mechanism that is disposed between the beam deflector and the dose cup and prevents a beam component having a trajectory deviated from the predetermined trajectory from being incident to a measurement region of the dose cup.

主权项

1. An ion implanter comprising:
a beam deflector that deflects an ion beam incident through a previous stage beam path in a y direction by action of either or both of an electric field and a magnetic field and emits the beam to pass through a subsequent stage beam path extending in a z direction toward a wafer; a beam filter slit that is disposed on the subsequent stage beam path between the beam deflector and the wafer, partially shields the beam traveling through the subsequent stage beam path toward the wafer, and allows passage of a beam component toward the wafer, the beam component having a predetermined trajectory among beam components of the beam passing through the subsequent stage beam path; a dose cup that is disposed between the beam deflector and the beam filter slit and measures a part of the beam exiting from the beam deflector; and a trajectory limiting mechanism that is disposed between the beam deflector and the dose cup and prevents a beam component having a trajectory deviated from the predetermined trajectory, among beam components of the beam that exits from the beam deflector and is directed toward the dose cup, from being incident to a measurement region of the dose cup.