TARGET AND PROCESS SENSITIVITY ANALYSIS TO REQUIREMENTS

摘要

Systems and method are provided for analyzing target, process and metrology configuration sensitivities to a wide range of parameters, according to external requirements or inner development and verification needs. Systems comprise the following elements. An input module is arranged to receive parameters relating to targets, target metrology conditions and production processes, to generate target data. A metrology simulation unit is arranged to simulate metrology measurements of targets from the target data and to generate multiple metrics that quantify the simulated target measurements. A sensitivity analysis module is arranged to derive functional dependencies of the metrics on the parameters and to define required uncertainties of the parameters with respect to the derived functional dependencies. Finally, a target optimization module is arranged to rank targets and target metrology conditions with respect to the simulated target measurements.

主权项

1. A system for analyzing targets, comprising:
an input module arranged to receive a plurality of parameters relating to the targets, target metrology conditions and production processes, to generate target data; a metrology simulation unit for simulation arranged to simulate metrology measurements of the targets from the target data and to generate a plurality of metrics that quantify the simulated metrology measurements; a sensitivity analysis module arranged to derive functional dependencies of the metrics on the parameters and to define required uncertainties of the parameters with respect to the derived functional dependencies; and, a target optimization module for target optimization arranged to rank at least one of the targets and the target metrology conditions with respect to the simulated metrology measurements.