发明名称 URETHANE COMPOSITION AND POLISHING MATERIAL
摘要 The present invention addresses the problem of providing a urethane composition with excellent heat resistance and with which very hard moldings can be obtained. The present invention provides: a urethane composition comprising a base resin (i), which contains a urethane prepolymer with isocyanate groups obtained by reacting a polyol (A) with a polyisocyanate (B), and a curing agent (ii), the urethane composition being characterized in that the polyol (A) comprises a polyether polyol (a1) obtained by polymerizing an aromatic compound (a1-1) having two or more active hydrogen atom-containing groups and an alkylene oxide (a1-2); and a polishing material characterized in being obtained by thermosetting of said urethane composition and then slicing.
申请公布号 WO2016021317(A1) 申请公布日期 2016.02.11
申请号 WO2015JP67994 申请日期 2015.06.23
申请人 DIC CORPORATION 发明人 TAKACHI MANABU;GOTOH NAOTAKA
分类号 C08G18/65;B24B37/24;C08G18/10;H01L21/304 主分类号 C08G18/65
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