| 摘要 |
The present invention relates to a shutter device for opening and closing an FOUP stage nozzle of a load port, and more specifically, to a shutter device which opens or blocks the flow of a gas supplied to an FOUP and discharged from the FOUP through a plurality of nozzles installed on an FOUP stage where the FOUP detachably mounted on an upper part of the device, wherein the FOUP has a wafer loaded therein while being provided in a load port. The shutter device includes: a pair of connection portions each of which an end part is located on one side of an upper part of the nozzle to open or block an upper plane of the nozzle; a horizontal gear located between the connection portions; a pair of horizontal axes located on both sides of the horizontal gear, respectively, while being geared to the horizontal gear; and an actuator combined to the connection portion. According to the present invention, the durability of the nozzle is improved since the nozzle provided in the FOUP stage to introduce a purge gas into the FOUP to remove a residual gas, which is fume, remaining in the wafer and to discharge the gas including the fume is protected from particles, and the efficiency of the purge gas supplied to the FOUP and a discharge gas discharged from the FOUP is improved. |
