发明名称 ROLL-TO-ROLL ELECTROLESS PLATING SYSTEM FOR CONTROLLED SUBSTRATE DEPTH
摘要 A roll-to-roll electroless plating system for controlled substrate depth includes electroless plating solution disposed within an electroless plating bath, a conveyor system configured to convey a roll-to-roll substrate material through the electroless plating solution, a first depth setting roller disposed at an entry location of the roll-to-roll substrate material to the electroless plating solution, and a second depth setting roller disposed at an exit location of the roll-to-roll substrate material from the electroless plating solution. A diameter of the first and the second depth setting rollers is selected to dispose the roll-to-roll substrate material at a predetermined depth of the electroless plating solution.
申请公布号 US2016040290(A1) 申请公布日期 2016.02.11
申请号 US201414495373 申请日期 2014.09.24
申请人 Uni-Pixel Displays, Inc. 发明人 Chyan Yieu;Jin Danliang;O'Neil John-Paul
分类号 C23C18/16 主分类号 C23C18/16
代理机构 代理人
主权项 1. A roll-to-roll electroless plating system for controlled substrate depth comprising: electroless plating solution disposed within an electroless plating bath; a conveyor system configured to convey a roll-to-roll substrate material through the electroless plating solution; a first depth setting roller disposed at an entry location of the roll-to-roll substrate material to the electroless plating solution; a second depth setting roller disposed at an exit location of the roll-to-roll substrate material from the electroless plating solution, wherein a diameter of the first and the second depth setting rollers is selected to dispose the roll-to-roll substrate material at a predetermined depth of the electroless plating solution.
地址 The Woodlands TX US