| 发明名称 |
SUBSTRATE PROCESSING APPARATUS |
| 摘要 |
A substrate processing apparatus includes a mounting unit on which a substrate is mounted, a light generation and detection unit that forms an optical path parallel to a surface of the substrate at a location separated from the surface of the substrate by a predetermined distance and is capable of detecting shielding of the optical path, and a control unit that controls movement of at least one of the mounting unit and the optical path to control relative movement between the optical path and the substrate in a state where parallelism between the optical path and the surface of the substrate is maintained. |
| 申请公布号 |
US2016042985(A1) |
申请公布日期 |
2016.02.11 |
| 申请号 |
US201514630424 |
申请日期 |
2015.02.24 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
YAMADA NOBUHIDE |
| 分类号 |
H01L21/67;H01L21/66;G01N21/95;H01L21/677 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing apparatus comprising:
a mounting unit on which a substrate is mounted; alight generating and detection unit that forms an optical path parallel to a surface of the substrate at a location separated from the surface of the substrate by a predetermined distance and is capable of detecting shielding of the optical path; and a control unit that controls movement of at least one of the mounting unit and the optical path to control relative movement between the optical path and the substrate in a state where parallelism between the optical path and the surface of the substrate is maintained. |
| 地址 |
Tokyo JP |
