| 发明名称 |
METHOD FOR PATTERNING PHOTOSENSITIVE RESIN LAYER |
| 摘要 |
A method for patterning a photosensitive resin layer includes a forming process of forming, on a first photosensitive resin layer containing a first resin, a second photosensitive resin layer containing a second resin different from the first resin and a solvent and a patterning process of patterning the first photosensitive resin layer and the second photosensitive resin layer by simultaneously exposing and developing the first photosensitive resin layer and the second photosensitive resin layer, in which the second photosensitive resin layer is a water-repellent layer and the second resin has higher solubility in the solvent than the solubility of the first resin. |
| 申请公布号 |
US2016041469(A1) |
申请公布日期 |
2016.02.11 |
| 申请号 |
US201514817022 |
申请日期 |
2015.08.03 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Ikegame Ken;Ishii Miho |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for patterning a photosensitive resin layer, the method comprising:
forming, on a first photosensitive resin layer containing a first resin, a second photosensitive resin layer containing a second resin different from the first resin and a solvent; and patterning the first photosensitive resin layer and the second photosensitive resin layer by simultaneously exposing and developing the first photosensitive resin layer and the second photosensitive resin layer, wherein the second photosensitive resin layer is a water-repellent layer and the second resin has higher solubility in the solvent than the solubility of the first resin. |
| 地址 |
Tokyo JP |
