POST-CHAMBER ABATEMENT USING UPSTREAM PLASMA SOURCES

摘要

Embodiments of the disclosure relate to a remote plasma source for cleaning an exhaust pipe. In one embodiment, an apparatus includes a substrate processing chamber, a pump positioned to evacuate the substrate processing chamber, and an abatement system. The abatement system comprises a plasma gas delivery system positioned between the substrate processing chamber and the pump, the gas delivery system having a first end coupling to the substrate processing chamber and a second end coupling to the pump, a reactor body connected to the gas delivery system through a delivery member, a cleaning gas source connected to the reactor body, and a power source positioned to ionize within the reactor body a cleaning gas from the cleaning gas source. Radicals and species of the cleaning gas react with post-process gases from the substrate processing chamber to convert them into a environmentally and process equipment friendly composition before entering the pump.

主权项

1. An apparatus, comprising:
a substrate processing chamber having a substrate support disposed therein; a pump positioned to evacuate the substrate processing chamber; and an abatement system, comprising:
a plasma gas delivery system positioned between the substrate processing chamber and the pump, the gas delivery system having a first end coupling to the substrate processing chamber and a second end coupling to the pump;a reactor body connected to the plasma gas delivery system through a delivery member, the reactor body defining a plasma excitation region therein;a cleaning gas source connected to the reactor body; anda power source positioned to ionize within the plasma excitation region a cleaning gas from the cleaning gas source.