Substrate Heating Device, Substrate Heating Method and Computer-Readable Storage Medium

摘要

A substrate heating device includes: heating modules each having a processing vessel within which a heating plate is disposed, an gas inlet port for introducing a purge gas into a processing atmosphere, and an exhaust port for exhausting the processing atmosphere; individual exhaust paths each connected to the exhaust port of the heating modules; a common exhaust path connected to downstream ends of the individual exhaust paths of the heating modules; a branch path branched from the individual exhaust paths and opened to the outside of the processing vessel; and an exhaust flow rate adjusting unit configured to adjust a flow rate ratio of an exhaust flow rate of a gas exhausted from the exhaust port into the common exhaust path and an introduction flow rate of a gas introduced from the outside of the processing vessel into the common exhaust path through the branch path.

主权项

1. A substrate heating device, comprising:
a plurality of heating modules, each of which includes a processing vessel within which a heating plate for mounting and heating a substrate is disposed, an gas inlet port for introducing a purge gas into a processing atmosphere existing within the processing vessel, and an exhaust port for exhausting the processing atmosphere; individual exhaust paths, each of which is connected to the exhaust port of each of the plurality of heating modules; a common exhaust path connected to downstream ends of the individual exhaust paths of the plurality of heating modules; a branch path branched from each of the individual exhaust paths and opened to the outside of the processing vessel; and an exhaust flow rate adjusting part configured to adjust a flow rate ratio of an exhaust flow rate of a gas exhausted from the exhaust port into the common exhaust path and an introduction flow rate of a gas introduced from the outside of the processing vessel into the common exhaust path through the branch path.