IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD

摘要

An imprint method for transferring a pattern formed on a mold onto a resin on a substrate. The substrate is held on a holding surface. A resin on the substrate is brought in contact with the mold. A partial region of the substrate is thermally deformed in a deforming step by irradiating the partial region with light. The resin is cured. The resin in contact with the mold is released. In at least a portion of the period during the deforming step, a region different from the partial region is held at a predetermined suction force, while holding the partial region at a suction force lower than the predetermined suction force.

主权项

1. An imprint method for transferring a pattern formed on a mold onto a resin on a substrate, the method comprising:
holding the substrate on a holding surface; bringing a resin on the substrate in contact with the mold; thermally deforming, in a deforming step, a partial region of the substrate by irradiating the partial region with light; curing the resin; and releasing the mold from the resin in contact with the mold, wherein, in at least a portion of the period during the deforming step, a region different from the partial region is held at a predetermined suction force, while holding the partial region at a suction force lower than the predetermined suction force.