发明名称 積層集積回路のための二面の相互接続されたCMOS
摘要 A stacked integrated circuit (IC) may be manufactured with a second tier wafer bonded to a double-sided first tier wafer. The double-sided first tier wafer includes back-end-of-line (BEOL) layers on a front and a back side of the wafer. Extended contacts within the first tier wafer connect the front side and the back side BEOL layers. The extended contact extends through a junction of the first tier wafer. The second tier wafer couples to the front side of the first tier wafer through the extended contacts. Additional contacts couple devices within the first tier wafer to the front side BEOL layers. When double-sided wafers are used in stacked ICs, the height of the stacked ICs may be reduced. The stacked ICs may include wafers of identical functions or wafers of different functions.
申请公布号 JP5859514(B2) 申请公布日期 2016.02.10
申请号 JP20130504948 申请日期 2011.04.06
申请人 クアルコム,インコーポレイテッド 发明人 アルヴィンド・チャンドレアスカラン;ブライアン・ヘンダーソン
分类号 H01L25/065;H01L21/3205;H01L21/768;H01L23/522;H01L25/07;H01L25/18 主分类号 H01L25/065
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