发明名称 液処理装置、液処理方法及び記憶媒体
摘要 A liquid treatment method includes: supplying a first organic solvent to a substrate with the substrate being held horizontally by a substrate holder; and thereafter supplying a second organic solvent to a substrate held by the substrate holder, the second solvent having a higher cleanliness than the first solvent.
申请公布号 JP5857864(B2) 申请公布日期 2016.02.10
申请号 JP20120098079 申请日期 2012.04.23
申请人 東京エレクトロン株式会社 发明人 吉田 勇一;吉原 孝介
分类号 H01L21/027;B05C9/10;B05C11/08 主分类号 H01L21/027
代理机构 代理人
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