| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin film manufacturing apparatus capable of suppressing the phenomenon that a coating liquid cannot be applied to a target position on a coating object due to adhesion of accompanying droplets to the edge of a nozzle hole, and an electromechanical conversion thin film provided with an electromechanical thin film manufactured by the thin film manufacturing apparatus, a droplet discharge head, and a droplet discharge device. <P>SOLUTION: The thin film manufacturing apparatus includes the droplet discharge head provided with a nozzle plate that has the nozzle hole and a nozzle plate electrode, the coating object opposed to the droplet discharge head, a counter electrode opposed to the droplet discharge head across the coating object, a counter electrode voltage applying means for applying a voltage to the counter electrode, and a nozzle plate electrode voltage application means for applying a voltage to the nozzle plate electrode. Two nozzle plate electrodes or more are lined in a predetermined direction with the nozzle hole as a starting point; accompanying droplets are moved in the predetermined direction by an electrostatic force from each nozzle plate electrode, and a voltage is applied to each nozzle plate electrode so that the accompanying droplets are drawn to the given nozzle plate electrode among the second or later from a nozzle hole side by the electrostatic force and are recovered. <P>COPYRIGHT: (C)2013,JPO&INPIT |
