MASK FOR PHOTOLITHOGRAPHY; METHOD OF MANUFACTURING THE SAME AND METHOD OF MANUFACTURING SUBSTRATE USING THE SAME
摘要
A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
申请公布号
EP2983043(A2)
申请公布日期
2016.02.10
申请号
EP20150170969
申请日期
2015.06.08
申请人
SAMSUNG DISPLAY CO., LTD.;INDUSTRY-ACADEMIC COOPERATION FOUNDATION YONSEI UNIVERSITY