| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning exposure device using a microlens array capable of highly accurately performing superposition exposure even when a glass substrate is deformed due to heat treatments in a plurality of layers in the superposition exposure and cause strain on a prior and existing pattern, in the exposure device using the microlens array. <P>SOLUTION: When a region of an exposure pattern 50f is exposed on an upper layer, a mask 3 is rotated about an optical axis of exposure light in accordance with thermal strain of a substrate 1, and a microlens array 2 is tilted in a plane perpendicular to the scanning direction 5. The magnification ratio of the pattern on the upper layer is thus adjusted with respect to the scanning direction and the perpendicular direction to the scanning direction so as to highly accurately perform superposition exposure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
