发明名称 |
Apparatus for manufacturing a mask |
摘要 |
A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern. |
申请公布号 |
US9256124(B2) |
申请公布日期 |
2016.02.09 |
申请号 |
US201213440112 |
申请日期 |
2012.04.05 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
Heo Jin-Seok;Park Chang-Min;Oh Seok-Hwan;Yeo Jeong-Ho |
分类号 |
B29C43/02;G03F7/00;B82Y10/00;B82Y40/00 |
主分类号 |
B29C43/02 |
代理机构 |
Lee & Morse, P.C. |
代理人 |
Lee & Morse, P.C. |
主权项 |
1. An apparatus for manufacturing a mask, the apparatus comprising:
a template having a design pattern; a correcting unit that divides an upper surface of the template into a plurality of regions, the correcting unit being connected to each of the regions to selectively correct a distorted region among the regions; a pressing unit that presses a polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and a curing unit that cures the mask pattern. |
地址 |
Suwon-si, Gyeonggi-do KR |