发明名称 Apparatus for manufacturing a mask
摘要 A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.
申请公布号 US9256124(B2) 申请公布日期 2016.02.09
申请号 US201213440112 申请日期 2012.04.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Heo Jin-Seok;Park Chang-Min;Oh Seok-Hwan;Yeo Jeong-Ho
分类号 B29C43/02;G03F7/00;B82Y10/00;B82Y40/00 主分类号 B29C43/02
代理机构 Lee & Morse, P.C. 代理人 Lee & Morse, P.C.
主权项 1. An apparatus for manufacturing a mask, the apparatus comprising: a template having a design pattern; a correcting unit that divides an upper surface of the template into a plurality of regions, the correcting unit being connected to each of the regions to selectively correct a distorted region among the regions; a pressing unit that presses a polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and a curing unit that cures the mask pattern.
地址 Suwon-si, Gyeonggi-do KR