| 摘要 |
PROBLEM TO BE SOLVED: To provide a mirror reflector for an illumination optical system capable of making special efficiency requirements for use of illumination light.SOLUTION: An image formation optical system for microlithography is used for illuminating an object field of view 12. An illumination optical system has a first transmission optical system for guiding illumination light 3 traveling from a light source. In the downstream of the first transmission optical system, an illumination preset facet mirror 7 having a plurality of illumination preset facets 25 is arranged. The illumination preset facet mirror 7 generates the preset illumination of the object field of view 12 by using the edge shape of the illumination preset facet mirror 7 that can be illuminated, and the individual inclination angle of the illumination preset facet 25. The first transmission optical system and the illumination preset facet mirror 7 are arranged so as to bring about telecentric illumination of the object field of view 12. |
