发明名称 |
Layered radiation-sensitive materials with varying sensitivity |
摘要 |
A method for fabricating a radiation-cured structure is provided. The method includes the steps of providing a first radiation-sensitive material and applying a second radiation-sensitive material to the first radiation-sensitive material. The first radiation-sensitive material has a first sensitivity. The second radiation-sensitive material has a second sensitivity different from the first sensitivity. At least one mask is placed between at least one radiation source and the first and second radiation-sensitive materials. The mask has a plurality of substantially radiation-transparent apertures. The first and second radiation-sensitive materials are then exposed to a plurality of radiation beams through the radiation-transparent apertures in the mask to form a first construct in the first radiation-sensitive material and a second construct in the second radiation-sensitive material. The first construct and the second construct cooperate to form the radiation-cured structure. |
申请公布号 |
US9256132(B2) |
申请公布日期 |
2016.02.09 |
申请号 |
US201414532031 |
申请日期 |
2014.11.04 |
申请人 |
GM Global Technology Operations LLC |
发明人 |
Rock Jeffrey A.;Fly Gerald W.;Lai Yeh-Hung;Newman Keith E.;Jacobsen Alan J.;Carter William B.;Brewer Peter D. |
分类号 |
G03F7/40;G03F7/20;G03F7/095 |
主分类号 |
G03F7/40 |
代理机构 |
Fraser Clemens Martin & Miller LLC |
代理人 |
Fraser Clemens Martin & Miller LLC ;Miller James D. |
主权项 |
1. A method for fabricating a structure, the method comprising the steps of:
providing a first radiation-dissociable material, the first radiation-dissociable material having a first sensitivity to a first radiation source; applying a second radiation-dissociable material to the first radiation-dissociable material, the second radiation-dissociable material having a second sensitivity to a second radiation source, the second sensitivity to the second radiation-dissociable material different from the first sensitivity to the first radiation-dissociable material; exposing the first radiation-dissociable material and the second radiation-dissociable material to a plurality of radiation beams through a plurality of radiation-transparent apertures in at least one mask, the plurality of radiation beams including a plurality of first radiation beams projected from the first radiation source and a plurality of second radiation beams projected from the second radiation source, wherein the first radiation source is different from the second radiation source; and removing a dissociated portion of the first radiation-dissociable material and a dissociated portion of the second radiation-dissociable material thereby forming a first construct from the first radiation-dissociable material and a second construct from the second radiation-dissociable material, wherein the difference between the first sensitivity to the first radiation-dissociable material and the second sensitivity to the second radiation-dissociable material results in the first construct being different from the second construct, the first construct and the second construct cooperating to form the structure. |
地址 |
Detroit MI US |