发明名称 Layered radiation-sensitive materials with varying sensitivity
摘要 A method for fabricating a radiation-cured structure is provided. The method includes the steps of providing a first radiation-sensitive material and applying a second radiation-sensitive material to the first radiation-sensitive material. The first radiation-sensitive material has a first sensitivity. The second radiation-sensitive material has a second sensitivity different from the first sensitivity. At least one mask is placed between at least one radiation source and the first and second radiation-sensitive materials. The mask has a plurality of substantially radiation-transparent apertures. The first and second radiation-sensitive materials are then exposed to a plurality of radiation beams through the radiation-transparent apertures in the mask to form a first construct in the first radiation-sensitive material and a second construct in the second radiation-sensitive material. The first construct and the second construct cooperate to form the radiation-cured structure.
申请公布号 US9256132(B2) 申请公布日期 2016.02.09
申请号 US201414532031 申请日期 2014.11.04
申请人 GM Global Technology Operations LLC 发明人 Rock Jeffrey A.;Fly Gerald W.;Lai Yeh-Hung;Newman Keith E.;Jacobsen Alan J.;Carter William B.;Brewer Peter D.
分类号 G03F7/40;G03F7/20;G03F7/095 主分类号 G03F7/40
代理机构 Fraser Clemens Martin & Miller LLC 代理人 Fraser Clemens Martin & Miller LLC ;Miller James D.
主权项 1. A method for fabricating a structure, the method comprising the steps of: providing a first radiation-dissociable material, the first radiation-dissociable material having a first sensitivity to a first radiation source; applying a second radiation-dissociable material to the first radiation-dissociable material, the second radiation-dissociable material having a second sensitivity to a second radiation source, the second sensitivity to the second radiation-dissociable material different from the first sensitivity to the first radiation-dissociable material; exposing the first radiation-dissociable material and the second radiation-dissociable material to a plurality of radiation beams through a plurality of radiation-transparent apertures in at least one mask, the plurality of radiation beams including a plurality of first radiation beams projected from the first radiation source and a plurality of second radiation beams projected from the second radiation source, wherein the first radiation source is different from the second radiation source; and removing a dissociated portion of the first radiation-dissociable material and a dissociated portion of the second radiation-dissociable material thereby forming a first construct from the first radiation-dissociable material and a second construct from the second radiation-dissociable material, wherein the difference between the first sensitivity to the first radiation-dissociable material and the second sensitivity to the second radiation-dissociable material results in the first construct being different from the second construct, the first construct and the second construct cooperating to form the structure.
地址 Detroit MI US