发明名称 |
Methods of singulating substrates to form semiconductor devices using dummy material |
摘要 |
In one embodiment, a method of forming a semiconductor device includes forming openings in a substrate. The method includes forming a dummy fill material within the openings and thinning the substrate to expose the dummy fill material. The dummy fill material is removed. |
申请公布号 |
US9257342(B2) |
申请公布日期 |
2016.02.09 |
申请号 |
US201414260903 |
申请日期 |
2014.04.24 |
申请人 |
Infineon Technologies AG |
发明人 |
Stranzl Gudrun;Zgaga Martin;Kahn Markus;Denifl Guenter |
分类号 |
H01L21/82;H01L21/78;H01L21/8258;H01L21/308 |
主分类号 |
H01L21/82 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A method of forming a semiconductor device, the method comprising:
forming a plurality of active elements in a semiconductor substrate having a first side and an opposite second side, the plurality of active elements being formed adjacent the first side; forming metallization, at the first side, over the plurality of active elements to form a plurality of devices; forming openings in the semiconductor substrate, the openings surrounding each of the plurality of devices; and forming a dummy plug within the openings; providing a tape over the opposite second side of the semiconductor substrate; providing a frame and an adhesive covering the first side of the semiconductor substrate, wherein a portion of the adhesive is disposed within the openings covering the dummy plug; and singulating the semiconductor substrate
by removing the frame and the adhesive andfollowed by removing the dummy plug in the openings from the first side of the semiconductor substrate. |
地址 |
Neubiberg DE |