发明名称 Methods of singulating substrates to form semiconductor devices using dummy material
摘要 In one embodiment, a method of forming a semiconductor device includes forming openings in a substrate. The method includes forming a dummy fill material within the openings and thinning the substrate to expose the dummy fill material. The dummy fill material is removed.
申请公布号 US9257342(B2) 申请公布日期 2016.02.09
申请号 US201414260903 申请日期 2014.04.24
申请人 Infineon Technologies AG 发明人 Stranzl Gudrun;Zgaga Martin;Kahn Markus;Denifl Guenter
分类号 H01L21/82;H01L21/78;H01L21/8258;H01L21/308 主分类号 H01L21/82
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A method of forming a semiconductor device, the method comprising: forming a plurality of active elements in a semiconductor substrate having a first side and an opposite second side, the plurality of active elements being formed adjacent the first side; forming metallization, at the first side, over the plurality of active elements to form a plurality of devices; forming openings in the semiconductor substrate, the openings surrounding each of the plurality of devices; and forming a dummy plug within the openings; providing a tape over the opposite second side of the semiconductor substrate; providing a frame and an adhesive covering the first side of the semiconductor substrate, wherein a portion of the adhesive is disposed within the openings covering the dummy plug; and singulating the semiconductor substrate by removing the frame and the adhesive andfollowed by removing the dummy plug in the openings from the first side of the semiconductor substrate.
地址 Neubiberg DE