发明名称 質量分析方法および装置
摘要 Provided is a sample analysis method of irradiating a sample with a primary ion beam to analyze a secondary ion emitted from the sample by mass spectrometry, the sample analysis method including the steps of cooling a sample placed in a chamber; forming an ice layer on a surface of the cooled sample by discharging one of water and an aqueous solution to the chamber; and irradiating the surface of the sample with the primary ion beam with the ice layer being formed thereon, wherein an amount of the water forming the ice
申请公布号 JP5854781(B2) 申请公布日期 2016.02.09
申请号 JP20110251621 申请日期 2011.11.17
申请人 キヤノン株式会社 发明人 青木 直文;小松 学;教學 正文;橋本 浩行
分类号 G01N27/62;G01N23/225 主分类号 G01N27/62
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