发明名称 |
Photoelectric conversion element and imaging device |
摘要 |
The solid-state imaging device includes lower electrodes acting as pixel electrodes, an organic photoelectric conversion film formed on the lower electrodes and generating electric charge in response to received light, and a transparent upper electrode that are formed on a substrate having signal readout circuits. The organic photoelectric conversion film, a transition area having at least one of its film thickness and film quality undergone transition from a film thickness and film quality of an area corresponding to a pixel electrode area in which the lower electrodes have been formed is an area that starts from an outer edge of the organic photoelectric conversion film and ends at a point away from the outer edge by a distance of 200 μm or less. |
申请公布号 |
US9258463(B2) |
申请公布日期 |
2016.02.09 |
申请号 |
US201414222413 |
申请日期 |
2014.03.21 |
申请人 |
FUJIFILM Corporation |
发明人 |
Mitsui Tetsuro;Sugiyama Takuro |
分类号 |
H04N5/225;B82Y10/00;H01L27/30;H01L51/00;H01L51/42 |
主分类号 |
H04N5/225 |
代理机构 |
Studebaker & Brackett PC |
代理人 |
Studebaker & Brackett PC |
主权项 |
1. A solid-state imaging device in which lower electrodes acting as pixel electrodes, an organic photoelectric conversion film formed on the lower electrodes and generating electric charge in response to received light, and a transparent upper electrode are formed on a substrate having signal readout circuits,
wherein in the organic photoelectric conversion film, a transition area having at least one of its film thickness and film quality undergone transition from a film thickness and film quality of an area corresponding to a pixel electrode area in which the lower electrodes have been formed is an area that starts from an outer edge of the organic photoelectric conversion film and ends at a point away from the outer edge by a distance of 5 to 200 μm, and wherein the distance is in a plane that is parallel to a surface of the organic photoelectric conversion film. |
地址 |
Tokyo JP |